| The research of TiNiPd high temperature shape memory films is important for Micro-Electro-Mechanical Systems (MEMS) working at 100oC~200oC. As an applying fundamental research, in this paper the TiNiPd shape memory films were studied with the emphases on the fabrication and treating technology, crystallizing and oxidizing characteristic, shape memory effect, phase transformation and microstructure, tensile performance and internal friction etc. using DSC, DMA, XRD, TEM, magnetron sputtering, film tensile test, curvature strain measuring and so on.Firstly, TiNiPd films'fabrication and their component control were investigated. Large pieces TiNiPd films with preconcert composition were made by the magnetron sputtering using alloy target with Ti foils. The results show that comparing with the composition of the target, in the film the Pd content decreases and Ni content increases distinctly but Ti content changes not so. With Ti foils on the alloy target Ti content increases at the correspond area on film while Ni content decreases but Pd content changes little.It was found that the substrate property and sputtering power affected the composition of films. There is variant composition on deferent substrate at same sputtering condition. When increasing sputtering power the Ti content in sputtering films decreases markedly while Ni and Pd content increases a little. The sputtering TiNiPd films are amorphous structure and the atom arrangement in it is looser than that in TiNi films.The study about crystallizing point of TiNiPd sputtering films shows that the crystallizing point of free films is more relate to composition of the films but a little to the type of substrate. The increase of Ti content and the decrease of Pd content in TiNiPd films would lead to high crystallizing point of the films, in which the effect of Ti is larger than that of Pd. The crystallizing point of free TiNiPd films is at about 480oC ~510oC and lower 30oC~50oC than that of the films adhering to substrate. The... |
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