ATOMIC MECHANISMS OF OXIDE NUCLEATION AND GROWTH AT THE ALUMINUM/OXIDE INTERFACE: A HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY STUDY |
Posted on:1987-11-01 | Degree:Ph.D | Type:Dissertation |
University:University of California, Berkeley | Candidate:LEE, JEONG YONG | Full Text:PDF |
GTID:1471390017458842 | Subject:Materials science |
Abstract/Summary: | PDF Full Text Request |
ighly detailed analyses of the crystallographic aspects required for nucleation and growth of aluminum oxide at the metal/oxide interface were carried out using high-resolution transmission electron microscopy. These analyses led to the modelling of the mechanisms of nucleation and growth at the atomic level.;It is concluded that the crystalline ;Results indicate that the hemispherical crystalline oxide nuclei, less than 25 A thick, protrude into the amorphous oxide from the macroscopically flat aluminum/crystalline oxide interface. In addition, the crystalline... |
Keywords/Search Tags: | Oxide, Interface, Nucleation and growth |
PDF Full Text Request |
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