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ATOMIC MECHANISMS OF OXIDE NUCLEATION AND GROWTH AT THE ALUMINUM/OXIDE INTERFACE: A HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY STUDY

Posted on:1987-11-01Degree:Ph.DType:Dissertation
University:University of California, BerkeleyCandidate:LEE, JEONG YONGFull Text:PDF
GTID:1471390017458842Subject:Materials science
Abstract/Summary:PDF Full Text Request
ighly detailed analyses of the crystallographic aspects required for nucleation and growth of aluminum oxide at the metal/oxide interface were carried out using high-resolution transmission electron microscopy. These analyses led to the modelling of the mechanisms of nucleation and growth at the atomic level.;It is concluded that the crystalline ;Results indicate that the hemispherical crystalline oxide nuclei, less than 25 A thick, protrude into the amorphous oxide from the macroscopically flat aluminum/crystalline oxide interface. In addition, the crystalline...
Keywords/Search Tags:Oxide, Interface, Nucleation and growth
PDF Full Text Request
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