Study On Optimum Design And Fabrication Of X-ray Broadband Multilayer

With the recent development of synchrotron radiation and space astronomy technique, a high photon flux optical element-X-ray broadband multilayer is desired urgently. In order to follow the tide of X-ray optics, we have carried out the research of X-ray broadband multilayer. From optical characteristics of materials based on the atomic scattering factor, the thesis introduces the reflectivity characteristic of X-ray from ideal and nonideal interface, discusses the method of selecting and confirming materials W,B4C for broadband multilayer. The refractive indexes of multilayer materials have been fitted for a suitable broadband multilayer design result. After conforming the minimum bilayers number, W/B4C broadband multilayers have been designed successfully by using a global optimization algorithm: Genetic Algorithms. The magnetron sputtering method is adopted to deposit multilayer samples. After accomplishing the calibration of deposition rate and minimum thickness experiments, we have successfully fabricated W/B4C broadband multilayer at Cu Kαradiation (0.154nm). The sample has been measured by X-ray diffractometer. Measurement result is consistent with the designed requirement. This research is supported by "863-804-7"Project of China.