| As a kind of surface technology, film/substrate system is developed quickly and widely used in several engineering field. Application of functional films on the surface of conventional material it allows to protect substrates and increase their working-life. But, there are also some new mechanical behaviors, which are found in this type of material structure, need to be solved.Film/substrate system belongs to multilayered structure, and there are obvious differences between layers in physical and mechanical property. Surface and interface are important character for this type of structure, so the mechanical behaviors exhibited in this structure are different from that in conventional material structure when force, moment or heat is applied on. Such as, residual stresses, surface/interface stresses, intrinsic stresses, buckling and delamination and so on. All of these affect the work efficiency and life of film/substrate structure, so it is nowadays of paramount importance to research the behavior of film/substrate in mechanical and thermo-logy field.In this paper, several mechanical behaviors of film/substrate system which are found to be difference from block material under temperature changes are modeled and analyzed. The contents of this study are as follows:1) An analytical model is used to study residual stresses and the shift of neutral axis in a multi-layered film/substrate system, and finite element method(FEM) is employed to exam and verify. The results show: the distribution of residual stress in each layer is linear in the thickness direction; the neutral axis shift with the combine of residual stresses and external bending moment, and there could be more than one neutral axis in this system.2) Buckling of thin film under compression residual stress has been studied in the follow aspects: buckling model under biaxial-compressive and uniaxial-compressive residual stress state; the relation of critical buckling stress with film thickness and...
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