External Total Reflection Angle X-ray Microanalysis Of Thin Film

External Total Reflection Angle X-ray Microanalysis of Thin FilmThe drawback of routine electron probe microanalysis(EPMA) is the uncertainty of the thin flim composition analysis. To deal with the problem , we performed a new method ,named External total reflection angle X-ray microanalysis. In this method , characteristic X-rays are measured at small take-off angles.Under this condition,The experiment was carried on a silicon substrate plated with pure aluminium and copper film. The result showed that the new method has more high surface sensitive than routine EPMA. Compared with TXRF , the obvious advantage of External total reflection angle X-ray microanalysis is its good image with the act of microanalysis.This paper have four sections and the main results are as following:In sec.l ,The overviews of the progress in surface analysis used XRMA were given.In sec.2,We proposed a new method,named external total reflection angle X-rays microanalysis. In this method,the electron induced X-rays are measured at small take-off angles, where the X-ray emitted from inside of the sample can not be observed due to refraction at the layer area and only the X-rays from near surface layer are detectable.The result indicated that the new method has more surface sensitive than conventional EPMA.hi sec.3,We studied acquiring X-rays spectrum at different angle.lt is shown that the relative intensity of the different lines has obvious variety. The causes is that substrate material absorption effect X-ray intensity.In sec.4 We applied this new method to Sr-doped BaTi03 material surface.the result indicated that the new method is very useful and has more high surface sensitive...