Study On The Wear-resistance Thin Film Fabrication Of The SiC On Carbon Steel

In each branch of the material science, the development of the thin film material science had been occupying the extremely important position. Compared with the bulk material, the thin film material is an entirely different material layer deposited or prepared on the bulk material by special method adopted. The reason why the thin film material is valued is that it usually has special performance or performance combinations.SiC is more and more valued and concerned by people in the last few years because of having very high calorifics, chemistry stabilities and good photoelectricity performance. Currently, the concentration of the domestic and international research of the thin film of SiC is in the field of micro-electronics and photoelectricity, the primary usage of the substrate material is monocrystalline Silicon, diamond and WC etc. The common preparation methods include Liquid Phase Epitaxial(LPE),Chemical Vapor Deposition(CVD),Molecular Beam Epitaxy(MBE) etc. However, in addition to the above-mentioned characteristic, the SiC is still having the good mechanics function, such as the very high degree of hardness, tribological proportities etc. Therefore, it is also thought to be one of the most hopeful materials of gas turbing, rocket nozzles, and engine components in astronautics and the automobile industries in the future.The preparation of SiC film by magnetron sputtering has many characteristics, such as high deposition rate, good film quality etc., especially the low film formation temperature and no influence on the substrate performance. So, it is very applicable to metal surface modification. In this topic, SiC films on 40Cr and T10 are gained by magnetron sputtering method. Influence of different process parameters, sputtering methods and Ni-P alloy interlayer on the quality of the films, is studied by X-ray diffraction test, FT-IR spectroscopic analysis, friction and wear test and scratching test.The results of experiment indicate that film prepared by magnetron sputtering at room temperature is amorphous. The FT-IR spectroscopic analysis proves that there is Si-C bond in the film. The film prepared by RF magnetron sputtering at 200W, 2h is smooth, densified and has good adherence. The Ni-P alloy interlayer can effectively improve adherence between film and substrate. The friction coefficient of SiC thin films is about half of that of the substrate. The Ni-P alloy interlayer can also farther decreases the friction coefficient and reduce the wear quantity. The film prepared by RF magnetron sputtering at 200W, 2h and0.1lPa has the best combination properties.