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Investigation Of Improving Strength And Transmission For Sapphire

Posted on:2007-07-20Degree:MasterType:Thesis
Country:ChinaCandidate:Q LiFull Text:PDF
GTID:2121360182478873Subject:Materials science
Abstract/Summary:PDF Full Text Request
Sapphire is the best one of all infrared windows and domes materials used for 3 5μm mid-wave infrared waveband for its optics,mechanics and calorifics. However, the strength of sapphire decreases rapidly at elevated temperature and its optical transmission cannot satisfy the demand of applications and design either. The most efficient way to solve the problem is to prepare anti-reflective and protective films on sapphire. Silicon dioxide (SiO2) and silicon nitride (Si3N4) are promising anti-reflective films for sapphire for their good physical and chemical properties and good adhesion to sapphire. Great progress has been made in the researches about SiO2 and Si3N4 anti-reflective and protective films overseas, but no domestic work has yet been done. Researches of this paper concentrate mostly on the design and preparation of anti-reflective and protective films on sapphire based on SiO2 and Si3N4, the preparation processing of SiO2 and Si3N4 and the effects of the processing on the properties of the films, and the preparation of SiO2 and Si3N4 on sapphire domes used as anti-reflective and protective coatings as well. The main contents and results are as follows:(1) With the help of OPFCAD software, anti-reflective and protective films of SiO2, SiO2/Si3N4, SiO2/Si3N4/SiO2 are designed on sapphire substrates. The results show that after SiO2, SiO2/Si3N4, SiO2/Si3N4/SiO2 films deposited on the surfaces of sapphires the average transmittances over 35μm waveband can exceed 97%, which can meet the requirements of missile dome.(2) Si3N4 films are prepared by RF reactive magnetron sputtering on Si and sapphire substrates. The effects of the depositing parameters on the depositing rates of the films are studied systematically, and thus the parameters are optimized. The prepared Si3N4 films are analyzed by XPS and XRD, which show that the deposited Si3N4 films are amorphous compound.(3) The designed films of SiO2/Si3N4 are prepared on sapphire by RF reactive magnetron sputtering. The average transmittance of sapphire over 35μm waveband can reach 92.21% after deposited films on both sides. The high temperature strengths of both coated and uncoated sapphires are tested, and the results show thatSi3N4 films can evidently improve the high temperature strength of sapphire which can satisfy the demand of window and dome.(4) The high temperature transmittance of both coated and uncoated sapphires are measured. The transmittance of them decline as the temperature rise.(5) The anti-reflective and protective films are successfully prepared on the dome simulator and sapphire dome by RF reactive magnetron sputtering.The average transmittance and uniformity can meet the demand of dome.
Keywords/Search Tags:Sapphire, Anti-reflective and protective films, Silicon dioxide, Silicon nitride, Magnetron sputtering, Transmittance, High temperature strength
PDF Full Text Request
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