The Research On TiN Films Deposited By Magnetron Sputtering

Being the first broadly and commercially utilized hard solid film material, the preparation and research relevant to TiN have been active continuously. TiN has been enthusiastically researched at home and abroad. TiN films are very important for industrial applications like cutlery and mould industry,decoration materials,integrated circuit for its high hardness and good wear-resisting properties, unique golden yellow, low resistivity, diffusion barrier properties.Formerly the research on the relationship between the microstructure of TiN films and its various properties were absent and especially the little attention was paid to the procedure for TiN films growth. Therefore the thesis will focus on the analysis of microprocedure for sputtering and depositing TiN films, the research and exploration of the procedure for TiN films growth, the regular relationship between microstructure or component and property in order to reinforce the application research foundation and supply beneficial reference for better properties of TiN films.TiN films are deposited by reactive magnetron sputtering. The microstructure,morphology,component,growth orientation of TiN films are affected regularly through controlling some parameters including deposition time,air pressure,nitrogen partial pressure,substrate temperature and bias voltage. At the same time the thesis also researches some properties of TiN films like deposition rate,microhardness,cohesion and so on. The thesis analyzes the intimate relationship between microstructure and property of TiN films.Of all the parameters, nitrogen partial pressure,substrate temperature and bias voltage are more important.Aiming at the effects on the microstructure,growth orientation and properties of TiN films, the thesis would pay more attention to the three parameters so as to acquire some laws for them.The surface and strain energies of TiN films are researched to know how they affect the growth orientation of TiN films.According to the fact that TiN films belongs to NaCl-type fcc, it is found that the surface and strain energies are relevant to preferred orientation of TiN films. At small film thicknesses the surface energy controls TiN films growth and a｛100｝preferred orientation is expected; At large film thicknesses the strain energy predominates and a｛111｝orientation is expected.Finally the thesis analyzes the particles sputtering rate and establishes the growth velocity model of TiN films and explores nucleus formation,crystal growth,the size of TiN films crystal. It is found that TiN films growth velocity equations can be acquired by combining the steps of forming gas source and the steps of diffusion; At different deposition temperature conditions the film growth thermodynamics or dynamics will predominate the growth of TiN films.