Haze Reduction By Mask Management System Optimization

When Mask used in Fab, mask will grow Haze due to environment and the method of mask storage. Haze growth is still a challenging topic in the world, though Haze growth isn't the biggest problem in the Fab. The biggest impact is that yield lost by Haze could not be caught in time and mask with Haze remain in use, and production cycle time delay due to mask remount. Studies on Haze reduction in the world are focused on how to find Haze earlier and reduce wafer yield impact.This paper will show how to optimize mask management system to meet the target of Haze reduction. We succeeded in setting up mask inspection system to find early Haze and optimize mask management system to reduce Haze impact.