The Investigation Of Fabricated The Textured Structure ZnO Film By Magnetron Sputtering

First,the development and utilization of solar energy is introduced. ZnO film with textured structure used as transparent electrode of amorphous silicon thin film solar cells, can longer the incident light path, increase the absorption of light and improve the efficiency of solar cells.For the textured structure ZnO thin films directly fabricated by magnetron sputtering, rising bias voltage will suppress 002 preferred orientation, appear 100, 101 and other diffraction peaks, which enhance the thin-film’s rough surface and decrease optical transmittance. Adding the sputtering power will increase the film’s grain size, improve the crystal quality and present pyramid-like textured morphology. Up to the substrate temperature at 150℃, the 101 preferred orientation of ZnO thin film appears. But the temperature increase further, ZnO thin-film appears only 002 preferred orientation again. It was also found that the sputtering pressure and film thickness will affect the preferred orientation, and annealing temperature can further improve the quality of ZnO thin films.The optimum technological parameters preparing the pyramid-like textured ZnO films was background vacuum of 5×10^-4Pa, bias of 130V, sputtering power of 200W, sputtering pressure of 1Pa, substrate temperature of 150℃, respectively.A mirror stucture ZnO film as-prepared by magnetron sputtering was etched by acid-etched technique, its crater textured ZnO film was fabricated. It was found that the pyramid-like textured ZnO film has better light trapping effect in the 300nm-400nm and 600nm-900nm wavelength compared with crater textured ZnO film.