Effects Of Secondary Cold-rolled Intermediate Annealing On The Evolution Of Micro Structure In Grain-oriented Silicon Steel Based On CSP Technology

Oriented silicon steel is mainly used for the production of transformer core. Productquality of oriented silicon steel are regularly regarded as an important symbol to measuremanufacturing technology level of special steel in a country because of its complicatedfabrication technology, strict constituents, long manufacturing procedure and a lot ofinfluence factors.Thin slab casting and rolling technology used in producing oriented silicon steel is atechnology that can avoid many disadvantages during heating at high temperature inconventional manufacturing technology, reduce procedures and costs. Producing siliconsteel by CSP technology has been a developing direction in the future silicon steelinderstry. At present, some related reports are very common in foreign contury, andapplied for the patent in the field. There are also a lot of basic research reports for CSPtechnology of oriented silicon steel production in our contury, however, the effect of coldrolling method on microstructure and texture of grain oriented silicon steel has rarelyseen.Based on the laboratory simulation of Fe-3%Si steel produced by CSP process asthe research object, hot rolled silicon steel sheet conduct a series of processing, includenormalizing, once cold rolling, intermediate annealing, secondary cold rolling,decarburization annealing and high-temperature annealing. Experiment with differentintermediate annealing temperature, to explore the influence of intermediate annealingtemperature on structure、texture and inhibitor distributed of oriented silicon steel. Usingmodern analytical techniques analyzed the inhibitor precipitation of the normalizing,intermediate annealing, decarburization annealing and high temperature annealingsamples, different process of macro texture and microstructure were analyzed, andanalyzed the secondary recrystallization, the analysis result has certain directivesignificance to the development of CSP technology of low cost orientation silicon.The results show that, compared with the intermediate annealing at850℃,940℃annealed abnormal grain growth phenomenon is more pronounced, more favorable to getfinal Goss texture,the final Goss texture intensity larger than former. View on inhibitors distribution, inhibitors of decarburization annealing the sample after intermediateannealing at940℃distribution is more dispersed, thereby inhibiting recrystallizationgrain growth. Micro orientation analysis found that intermediate annealing at940℃afterhigh temperature annealing samples, the abnormal growth of Goss grain around by themany small grains and not easy to be swallowed by Goss orientation, they are cubeorientation and rotation cube orientation. On secondary recrystallization process stagesampling analysis, found the secondary recrystallization starting temperature was in therange of1000~1050℃.