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The Subtractive Color Filter Based On Micro/Nano Structure

Posted on:2015-09-13Degree:MasterType:Thesis
Country:ChinaCandidate:H XuFull Text:PDF
GTID:2181330428499270Subject:Optical engineering
Abstract/Summary:PDF Full Text Request
Surface plasmonic subtractive color filters have received extensive attention as anext-generation color filter technology to be applied in display industry,duo to theircolor tunability,easy processing and high reliability.We design and present atransmissive subtractive color filter which has double dielectric-metal gratingstructure.The structure includes the following three parts:quartz substrate,dielectricgrating layer and metal grating layer.For different polarized incident wave,we userigorous coupled-wave analysis (RCWA) method to study the grating structure andachieve high transmittance output of any color in the visible range of light by means ofcontrol the structure parameters in the case of TM wave incident,especially for threeprimary color cyan,magenta and yellow of subtractive color mixture,the maximumtransmission achieve85%,compared to the previous structure proposed in theliterature,the transmittance of the CMY subtractive primary colors enhance10%-25%in this paper,and the FWHM has been further optimized.Some processing techniques like dual-beam holographic interferometry, vacuumcoating and lift-off have been used to make one-dimensional subwavelength metalgrating with the period of230nm,for TM wave incident,yellow output has beenachieved.The process is simple,low cost,suitable for mass production and has great valuein image display industry.
Keywords/Search Tags:subwavelength grating, plasma surface plasmonpolarization, subtractive color mixture, color filter
PDF Full Text Request
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