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Amorphous Carbon / Mo <sub> 2 </ Sub> C Composite Films Preparation And Field Emission Performance

Posted on:2007-05-18Degree:MasterType:Thesis
Country:ChinaCandidate:C Y WangFull Text:PDF
GTID:2190360185471130Subject:Condensed matter physics
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Flat panel display (FPD) is a desirable display device because of its advantages of low weight, small volume and low power consumption. Nowadays Field emission display (FED) became the focus of the study of FPD, and it would be a replacer of cathode ray tube(CRT) . The key point in technologies of field emission display (FED) is to prepare field emitters with good field emission capability. The carbon based materials have low electron affinity (EA) even negative electron affinity(NEA),and have the good ability of eradiating electrons in electric field. So it became the hotspot of many research groups in recent years. Especially amorphous carbon has good chemical inertness, thermal stability, high melting point, high thermal conduction coefficient, small dielectric constant, large carriers transition velocity and high breakdown voltage, and it may be a material of field emission cold cathode with good future.The thesis contains following contents:(1) The preparation and the measurement of field emission properties of amorphous carbon and Mo2C complex film;The film was prepared on Al2O3 substrate on which transition metal layer was sputtered by using microwave plasma enhancement chemical vapor deposition (MPECVD) system. Surface morphology and microstructure of films were tested by SEM, XRD, and Raman spectroscopy. By comparing different experimental parameters such as the granular of SiC grinding on the substrate, the transition layer and the reaction time, temperature and the power of the microwave which influence on the characters of the film We concluded that the film with the best field emission properties was prepared under the following condition: the substrate was grinded by W20 SiC and Mo was sputtered on it. When the microwave power was 1700w and the temperature was about 800℃ it was deposited on the substrate for 4 hours. A diode structure was used in field emission measurement under a certain vacuum condition (< 5 × 10-5Pa) and field emission spots were recorded by CCD through anode coated with phosphors. Results showed that the film was the complex film of amorphous carbon and Mo2C,...
Keywords/Search Tags:microwave plasma chemical vapor deposition (MPCVD), field emission, the complex film of amorphous carbon and Mo2C, FED numeral-tube
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