Fabrication Of Super-Hydrophobic Micro-Nano Structure And Conducting Patterns Based On Ultraviolet Lithography

The discovery of conducting polymers (CPs) leads to a huge impact in technical innovation of microelectronics and optoelectronics industry manufacture. And fabricating three-dimensional micro-nano structure conducting polymers patterns have widely uses in displays、memory devices、integrated circuit and high sensitive sensors. In this study, we reports on the selective deposition of hydrosoluble conducting polymer on functional hydrophilicity/hydrophobicity polymeric substrate which is modified by UV-NIL fabricates successfully conducting patterns and circuit.Firstly, we fabricated a PDMS soft mold with highly hydrophobic surface property. The PDMS mold was fabricated by simply replicating the bamboo leaves surfaces in one step:just make a replication from bamboo leaves via a transfer process. With the tests of the imprinted patterns’characterization, we had proved that the PDMS mold has a perfect copy of the micro structure of the bamboo leaf and the imprinted pattern maintains the super-hydrophobicity.Secondly, hydrophilic substrate was modified by ultraviolet nanoimprint lithography with PDMS mold to obtain different sizes hydrophilicity/hydrophobicity functional and linear surface. The PEDOT:PSS water-dispersion can selectively deposit only on the hydrophilic area, then PEDOT:PSS doped with dimethylsulfoxide(DMSO) was patterned on the polymeric surface by Spin Coating. The PEDOT:PSS was heated at 80℃ and maintained about 5-10 min. Thus we can obtain linear sizes range from 50 to 500μm conducting polymer patterns. And the patterns have high light transmittance and conductivity.Besides, we synthesized and prepared UV resist containing KDA as the cross-linker to imprint hydrophilicity/hydrophobicity polymeric surface. The resist formulations with ketal containing diacrylate is found to be degradable in acid organic solution. Thus the resist has fine etching ability and the hydrophobic area on the hydrophilic substrate can be removed to obtain conducting patterns of good quality. And with the same preparation process, we can fabricate a series conducting patterns with different linear width, as well. It is certain that the conducting polymers have an extremely low solubility in common organic reagent, thus conducting patterns with near zero residual of resist were made on hydrophilic substrate after immersing the substrate in organic acid solution completely to stripping the degradable resist. And the acid circumstance has no influence on the pattern integrity and the optic and electrical properties of the conducting patterns.