Large Planar Sputtering Film Coating Equipment Heating System Analysis And Optimization

In the process of the large area planar substrate during magnetron sputtering, the substrate surface temperature of particles in the substrate surface adhesion, migration, nucleation and crystallization had an important influence. Therefore, to improve the uniformity of the substrate temperature is high-value thin films is a key issue. The paper discusses the large area planar substrate during magnetron sputtering equipment heating system in different heating temperature of substrate temperature uniformity, which made high-quality large flat glass substrate heating during film the best process parameters.Experimental method of this topic is used with the substrate and heater temperature a typical point, i.e., using temperature sensor of heater and thermocouple substrate surface temperature measurement, the typical point five groups of substrate surface temperature stabilization typical when recording heater and substrate surface temperature typical data.Using experiments, combined with the heater set temperature and heat transfer theory, ANSYS finite element software for large plate-type magnetron sputtering film coating equipment and sputtering room for preheating temperature field simulation. The simulation results with experiments to verify the survey record, the validity of the model, and can guide the experimental coating heater temperature setting. Simulation and experimental results show that, when the substrate temperature set and heated to200℃, temperature uniformity is good. Paper made the error analysis of temperature field simulation results and the experimental measurements, finite element simulation that the ideal hypothesis, before the actual simulation model, when the actual model simplification heater and measurement error of thermocouple caused by simulation and experimental results deviation.Finally, this paper using ANSYS software development based on the surface of substrate module temperature uniformity, magnetron sputtering film coating equipment for heating power were optimized, obtained after the optimization the power of the heater temperature setting to experimental coating equipment. Optimization and experimental results show that, when the substrate temperature of large area planar magnetron sputtering is set and heated to200℃, substrate temperature uniformity is best,then the optimal temperature for the heater set heater temperature of234℃, the heater temperature of230℃, under the heater temperature is233℃. The application shows that this design method is convenient, can replace artificial try to gather the troublesome.