TiO₂Nano Thin Film Deposited By Frequency Reactive Magnetron Sputtering And Treated By Laser Irradiation

In this paper, TiO2thin films were deposited on glass by frequency reactive magnetron sputtering technique at lower temperatures. And a novel processing method, laser irradiation, was used to improve the crystal quality and optical properties.We have prepared TiO2thin films with different structures and properties by controlling parameter method, such as changing substrate temperatures, argon and oxygen flow ratio, deposition time. In this paper, we have analyzed the surface component, surface structure, and the crystal structure of TiO2thin films under different conditions by testing X-Ray Energy Dispersive Spectroscopy (EDS), Atomic Force Microscope (AFM) as well as X-Ray Diffraction (XRD), and we also have analyzed the optical and electrical properties including light absorption, photocatalytic and Hall effect in order to optimize the parameters.Laser irradiation was chosen because of it’s fast heating, high energy density, less sample heat exposure, low energy consumption, and little damage on the film substrates. We analyzed the structure and properties of films irradiated by laser in order to optimize the laser irradiation parameters. It’s important for treating films deposited on flexible substrate at low temperature in the future.