The Farbrication And Application Of Color Filter Array

Compare with ink, structure color has the advantages bright hueno-pollution and non-fading. Bacause of the complex structure orcumberisome process,it’s difficult to apply to industrial production.Nano-imprint lithography is gradually developed technology in recent years.With the advantage of high resolution, high efficiency and low cost, it hasknown as “one of the technologies that could change the world”.Combing nano-imprint technology and physical vapor depositiontechnology, we propose a method of fabricating a metal-dielectric-metal colorfilter array in this paper. Firstly, the reflection spectra characteristic isanalyzed as a function of thickness of each layer. Details of the fabricationprocess is proposed. The micro pattern array templates have been producedwith the technology of DMD lithography and electroforming. Then weproduce the color filter array with the UV imprint and metal deposition.We propose a structure to achieve dynamic moire effects without ink. Amicrolens array and a corresponding color filter array are integrated onto alayer of polyester film. When varying the viewing angle., it can show themotion effect and color change effect which can enhanced security features.Finally, the subject of this study is summarized, and point out what canbe done in the future work.