Research On Underlayer Materials For SmCo₅Films Of Perpendicular Magnetic Recording And Preparation Of The Templates For Patterned Media

SmCo5film is proved to be able to maintain the thermal stability of the small magnetic particles and has become a promising candidate for ultra-high density magnetic recording media due to its large uniaxial magneto-crystalline anisotropy. Therefore it is meaningful to carry out the research on SmCo5film and its bottom material preparation technology, magnetic properties and its related mechanism. In magnetic recording areas, bit-patterned recording mode can greatly improve the recording density; so it is particularly important to study bit-patterned media template preparation process because of its potential to become one of the replacement for the traditional vertical magnetic continuous film.This paper first introduced magnetron sputtering system, and briefly described the traditional lithography, electron beam lithography and ICP etching technologies and equipments. Furthermore microscopic analysis of the film samples and magnetic properties test of SmCo5film sample were introduced.After the study of SmCo5/Cu/TiW film preparation process and the following investigation of the influence of the introduction of TiW seed crystal layer on magnetic properties of SmCo5Cu film, We made a conclusion the magnetic properties of SmCo5Cu films increase with the thickness of TiW seedlayer until the thickness of5nm, then decease rapidly. The optimal coercivity and magneto-crystalline anisotropy in perpendicular direction of the film are3719Oe and1.04×107erg/cm3, respectively. The excellent barrier function and the large surface energy of TiW seedlayer play a significant role in the improvement of the microstructure and surface morphology of Cu underlayers, hence promote the magnetic properties of SmCo5/Cu film.This paper then studied the preparation of template including two-dimensional ordered micron meter-grade hole and pillar array respectively on the surface of Si chip with the application of traditional lithography and ICP etching technology, as well as the preparation of template including two-dimensional ordered nano-grade hole array on the surface of Si chip with the application of electron beam lithography and ICP etching technology. It made important significance for our project team carrying out research on discrete SmCo5recording materials with the success of preparation of the template.