The Characterization And Preparation Of Three-dimensional Porous Boron-doped Diamond (BDD)/Ti Coating Electrode

Recently, boron-doped diamond electrodes have been extensively studied as anew technological potential material due to their wide range of applications, such aselectrooxidation, electrosynthesis, capacitor and transducer. However, several factorsare found to restrict the use of boron-doped diamond electrodes. The most weaknessof theirs is the poor effective reaction area, leading to lowest mass transfer efficiency.In this paper, boron-doped diamond film grown on three-dimensional (3D) poroustitanium substrate with different porosity was obtained by hot filament chemical vapordeposition (HFCVD) technique in the same preparation conditions and parameters.The morphology and structure of these electrodes were studied by scanning electronmicroscopy (SEM), X-Ray Diffraction (XRD), Raman spectrum method and mercuryinjection apparatus respectively. Electrochemical response was characterized by cyclicvoltammetry measurement. The working life of the electrodes was estimated byaccelerated life test. Results showed that electrodes with different porosity wereobtained successfully. The substrates were totally covered by a diamond coatingincluding three-dimensional substrate surface plane as well as its inner surfaces,leading to a3D porous diamond/Ti composite material formation.3D porousdiamond/Ti enhanced the electrochemical activity and sustained the working life,showing the potential as excellent candidate for electrode materials.