Research On The Rapid Non-destructive Technology Of Plasma Polishing

As a new efficient kind of technology of surface processing method, which can replace the traditional processing methods, atmospheric plasma polishing not only has advantages of low cost, pollution-free, the application of wide, but also avoids machined workpiece surface damage or subsurface damage. Atmospheric plasma polishing has wildly use in the processing of precision optical components. It is the key of the technology of optical components processing in defense, astronomy and many other fields.To research on the rapid non-destructive technology of plasma polishing, atmospheric plasma jet polishing method for a workpiece efficient etching polishing is proposed in this paper. The core of this method is able to explore and realize an effective and high-speed plasma non-destructive method of polishing and related processes. Meanwhile the principle of arc discharge-based atmospheric plasma jet polishing device is developed. And according to the actual atmospheric plasma jet etching and polishing of physical chemical etching, the atmospheric plasma jet fire way and the atmospheric plasma jet reaction etching are proposed in this paper to study the processing of quartz glass.The experiment results showed that:1) arc plasma polishing device is simple and low cost. It can be used to polish the optical components plane, convex and concave surfaces, and other non-spherical surfaces. Moreover, It is high efficiency duo to the fire polishing method and etching reaction method are both included in this device.2) the etching efficiency of the quartz glass is high, and this method has no effect on the optical properties and mechanical properties of the quartz glass. The results showed that:a. The role of nitrogen pressure and the distance is the main factor affecting the polishing effect, the removal rate can reach5.2918μm/s, the surface roughness can be achieved0.0127μm, when the atmospheric plasma jet fire polishing; b. the main factors that affect the polishing is SF6flow and the effective distance, the removal rate can be achieved9.07μm/s, although a higher removal rate can be obtained, but the surface appears uneven edges problem of deterioration of rough, when the etching reaction of atmospheric plasma jet;3) In order to realize the entire surface of the quartz glass removal polishing, the technology of plasma polishing can from the point and line by line and surface processing. We polished quartz glass which diameter is50mm.The results showed that when the atmospheric plasma jet fire polishing, the surface roughness after polishing is reduced from O.33μm to0.13μm, reduced by2.5times, the polish effect is better. When atmospheric plasma jet etching reaction, although remove effectively of the material surface is high, but the inhomogeneity of surface roughness is unresolved. The desired effect has been achieved in this test, laying a foundation for future research.