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The Improvement And Simulation Analysis Of The Pulse Power Supply Of The Electro-spark Deposition

Posted on:2018-06-15Degree:MasterType:Thesis
Country:ChinaCandidate:G WeiFull Text:PDF
GTID:2321330512499870Subject:Mechanical engineering
Abstract/Summary:PDF Full Text Request
As a new metal surface treatment technology,electro spark deposition(ESD)technology has been widely used in the field of metal surface strengthening and damage repair.As the key part of the electro spark deposition system,the performance of the pulsed power supply has a great influence on the effect of ESD.The single pulse discharge energy and the pulse frequency of the transistor controlled pulse power supply used in the electro spark deposition processing have positive correlation and negative correlation with the capacitance.When depositing power and capacitance is higher,it shows lower pulse frequency and slower deposition rate.When depositing power of ESD processing is ordinary,it shows the disadvantages that pulse frequency and deposition efficiency is lower than the theoretical value.The pulse power supply is improved to solve this problem.The improvement of this pulse power supply is studied by using computer simulation technology,which is to evaluate the effect of deposition efficiency by improved pulse power supply.The improved strategy of pulse power supply is tested and verified.First of all,the transistor controlled pulse power supply is analyzed,and find many problems of this pulse power supply.In order to achieve the purpose of improving the deposition efficiency,the paper puts forward the improvement scheme of pulse power supply from three aspects,such as the precise regulation of the voltage,the charging and discharging mode and the control mode.Based on the "two level rectifier inverter" theory,using full wave bridge rectifier,filter,full wave bridge inverter,isolation transformer and full wave bridge rectifier transformer and other components,the charging voltage of the capacitor can be adjusted continuously.Based on the theory of "multi-loop power supply ",the multi charge and discharge circuit is adopted to reduce the pulse interval that is too large.In addition,an adjustable charge current limiting resistor is used to replace the fixed charge current limiting resistor,so as to reduce the pulse interval to reach the ideal value as much as possible.Based on the theory of "correlation schedule control",IGBT as switching element is using between switching power supply and charging current limiting resistor,so as to solve the discharge thatdischarge switch couldn't turn off in time after turn on.In order to realize the cooperative work of each charging and discharging circuit,the switch state of the discharge switch and charging switch in each charge and discharge circuit can be controlled by the clock circuit.Secondly,after the improvement on the pulse power supply,the non-linear transient temperature field analysis and thermal stress field analysis of the high-energy electro spark deposition by improved pulse power supply was carried out.The simulation results show that the pulse power supply can improve the efficiency of electro spark deposition,and the deposition efficiency increases with the decrease of pulse interval.Finally,compare experimental data of electro spark deposition.The results show that the improved pulse power supply can improve the efficiency of electro spark deposition in the process of high power spark deposition.
Keywords/Search Tags:electro-spark deposition, pulse power supply, deposition efficiency, pulse interval, simulating analysis
PDF Full Text Request
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