Preparation And Properties Of Ti-Si-N Hard Thin Films And Ti-Si-N/Ti Nanomultilayers By Reactive Magnetron Sputtering

With the rapid development of modem technology,Many industrial requirements of rigid coating tool are almost harsh.Ti-Si-N hard thin films and Ti-Si-N/Ti nanomultilayers have attracted great attention and research of many scholars,due to its extremely high hardness,excellent wear resistance,good binding force,excellent corrosion resistance and thermal stability.In this work,a series of Ti-Si-N hard thin films and Ti-Si-N/Ti nanomultilayers were prepared by DC reaction magnetron sputtering on 316L stainless steel substrate.X-ray diffraction,Scanning Electron Microscope,Energy Dispersive Spectrometer and Transmission electron microscopy are used to analysis crystal structure,surface morphology,the phase composition and elemental composition of the thin films.Micro-hardness Tester,scratch test apparatus,wear-resistant experiments and electrochemical workstation were used to test the hardness,adhesive strength,wear resistance and corrosion resistance of the thin films.This paper have studied each structure performance of Ti-Si-N films by changing the N2 flow,Si content and substrate temperature and each structure performance of Ti-Si-N/Ti nanomultilayers by changing the modulation ratio,Modulation period.Determined the best process parameters of the Ti-Si-N films.When the substrate temperature is 300?,N2 flow is 10sccm,working pressure is 0.3Pa,Si content of the Ti-Si target is 10at%and the Ti-Si target power is 800W,the Ti-Si-N hard thin films prepared have the typical structure of nc-TiN/a-Si3N4.Their comprehensive performance are the best:the micro-hardness is about 55GPa(the load is 25g,the excel time is 15s),the combining force is about 22N(the load is 100N,the load speed is 100N/min,the scratch length is 4mm),the friction coefficient is about 0.5(the load is 25N,the rotational speed is 20r/min,the friction pair diameter is 4mm,the test is 10min),the corrosion current is 1.5929x10-7A,the corrosion potential is-0.2919V.When the substrate temperature is 300?,N2 flow is 10sccm,working pressure is 0.3Pa,Si content of the Ti-Si target is 10at%and the Ti-Si target power is 800 W,the Ti target power is 600W,the modulation ratio is 1:2,modulation period is 80nm,the Ti-Si-N/Ti nanomultilayers' films structure is clearly visible,the white Ti-Si-N film and the dark Ti film growth alternate and flat.This kind of structure has good comprehensive performance:the micro-hardness is about 33GPa(the load is 25g,the excel time is 15s),the combining force is about 57N(the load is 100N,the load speed is 1OON/min,the scratch length is 4mm),the corrosion current is 1.4884x10-7A,the corrosion potential is-0.2067V.