Preparation Of Different Size Single Crystal Graphene And Its Imaging Detection Based On The Surface Plasmon Polariton

Graphene is a kind of photoelectric two-dimensional material with excellent performance,with high light transmittance of 97.7%,high electron mobility and high thermal conductivity,and its application value on optoelectronic devices is extremely high.The development of optoelectronic devices of different sizes poses a challenge to the preparation of graphene films of corresponding sizes.At present,the common method for industrially preparing graphene-is to prepare a surface of a metal substrate such as copper or nickel by chemical vapor deposition,but most of the polycrystalline graphene film is prepared by the technique,and the presence of grain boundaries reduces the excellent performance of graphene.And restrict the large-scale application of graphene.In addition,the preparation of graphene devices often requires the transfer of graphene prepared by CVD to a specific substrate surface to achieve its device performance,which requires effective imaging detection of the quality of the graphene substrate preparation.Conventional detection equipment is expensive or requires specific vacuum conditions,making the detection method of graphene inconvenient,so it is necessary to develop a simple and effective graphene imaging detection method.In this paper,a new imaging detection method for single crystal graphene is proposed.The preparation of single crystal graphene with different sizes by chemical vapor deposition,graphene-gold substrates and surface plasmon imaging for graphene detection are studied.The main research results are as follows:(1)The reliable preparation of single crystal graphene of different sizes by chemical vapor deposition was studied and obtained.Ar and O2 pretreatment can reduce the nucleation density of graphene and the appropriate CH4 concentration to facilitate the growth of single crystal graphene.The influence of the size of the single crystal on the morphology and growth time of the single crystal determines the size of the single crystal.Through the adjustment of pretreatment gas and flow,growth pressure and time parameters,a reliable preparation process of single crystal graphene of 0.01-6 mm size was obtained.In addition,the formation mechanism of impurity particles in the preparation of graphene is also studied The introduced impurity particles may be due to the crystal particles after oxidation of the substrate Cu and the falling off of the quartz tube under high temperature conditions.(2)A graphene-gold substrate that can be used in a surface plasmon imaging system was studied and prepared.By comparing the four preparation methods of graphene-gold substrate in surface plasmon imaging system:unsupported mode of PMMA transfer method,unilateral support mode,four-sided support mode and PDMS-assisted AZ5214 photoresist,and darkened Preliminary observation of field optical microscopy showed that the graphene-gold substrate prepared by the "unilateral support method" using PMMA transfer method has better effect,and the preparation method also provides high substrate preparation for other new graphene-based devices.Reference value.(3)A new imaging detection method for single crystal graphene was proposed and implemented.Imaging detection of single crystal graphene on a gold substrate in a surface plasmon imaging system,and comparison of SEM images of single crystal graphene on a gold substrate,verified a single crystal graphite by surface plasmon imaging system.A new way of detecting images of alkenes.At the same time,the surface plasmon imaging system can detect defects and impurity particles on the surface of graphene,and further experiments show that the defective graphene may reduce the surface plasmon imaging quality.