Electrodeposition Silicon Membrane On The Graphite Flake In Molten Salt

Silicon film is a kind of important material for semiconductor,electronics,lithium-ion batteries,medical field,especially solar cells were applied.However,the organic silicon is usually used as raw material,which is dangerous to store,and the prepared equipments are strict and high cost.It is always focus to low price prepare the density crystalline silicon film.In this paper,the cheap graphite rod and foil were used as anode and the cathode respectively,and molten calcium chloride was used as the electrolyte,the silicon was obtained from the electrochemical reduction of nano-silica powders which was dispersed in molten CaCl2.The graphite foil with and without Ag were used as the substrate respectively,the products were characterized by SEM,EDS and XRD.The conditions:temperature 870?,concentration of nano-silica powders in molten salt 0.15mo1·L-1,-3.0V potentiostatic electrodeposition for 4h,are appropriate.Under which,the silicon film obtained on the graphite substrate without Ag was about 2.29?m thick and density.On the graphite substrate with Ag,the appropriate silicon film deposition conditions were:temperature 870?,concentration of nano-silica powders in molten salt 0.15mol·L-1,-3.0V potentiostatic electrodeposition for 3h.Under which,the silicon film obtained on the graphite substrate with Ag was about 5.15?m thick and density.