The Technology Of Ion Beam Processing For Preparation Of Ultrathin Film And Its Application

With the rapid development of flexible electronics industry represented by flexible energy,flexible display and flexible sensing,the high quality manufacturing of flexible transparent conductive film,one of the core components,has played a key role.The flexible conductive materials like carbon nanotubes,graphene and silver nanowires that have been developed suffer from various problems such as random arrangement,difficult manufacturing,complicated processes,high costs,and inability to manufacture large areas.Other transparent conductive materials,such as indium tin oxide,have the problem of limited bending resistance,so they cannot meet practical needs.Because metal has a series of excellent properties such as high electrical conductivity and high elongation,researchers in recent years have begun to turn their attention to metal materials,hoping to produce thinner metal films for flexible-related applications.At the same time in the scientific community,scientists have also turned their attention to extremely small and extremely high-precision research.Metal thin films with a thickness of a few nanometers are only atomic in thickness,and it is predicted that they will have dielectric and quantum nonlinear optical properties that conventional thin films do not have.If ultra-thin metal thin films can be made,all these scientific hypotheses can be truly verified experimentally.However,due to the high surface energy characteristics of the metal material itself,it grows in the form of islands during the metal deposition process.In the thinner stage,the surface of the metal film shows incomplete voids and grooves,which seriously affects the performance.It is impossible to make nanoscale thin metal films under normal circumstances.Aiming at the problem that metal film is difficult to process and prepare,this thesis has studied,the main contents include:(1)A thin film preparation process based on ion beam polishing was proposed.The silver film manufactured by this process can achieve better surface roughness,better conductivity and fewer surface defects than the traditional sputtering process under the same thickness.And the thin film with a thickness of 4 nm was prepared during the experiment,which was rarely reported.The morphology of the film was still relatively complete under the electron microscope.(2)The process parameters,like substrate,initial polishing thickness,polishing energy and seed layer modification,which may affect the ion beam polishing process were studied,so as to infer the in-depth factors that affect the ion beam polishing preparation.(3)The process of ion beam polishing was applied to the preparation of flexible substrate film,and the flexible transparent conductive film was made.Compared with the commercial flexible indium tin oxide samples,the change ratio of resistance presented by experimental samples after flexural fatigue test is 52 times less than that,and it has certain commercial value.(4)Through time-domain finite analysis methods,the possible applications of patterned metal thin films are predicted,and advanced processing methods such as electron beam lithography and ion beam etching are used to explore metal thin film patterning processing techniques,which lays a manufacturing foundation for related scientific research.Compared with the traditional sputtering process,the ion beam polishing process described in this thesis has a significant improvement in the morphology of films prepared,and thinner films with complete morphology can be prepared through ion beam polishing process.The related results may be applied to the field of flexible transparent electric conduction and have a certain market prospect.And because of the successful manufacture of ultra-thin metal films,it is possible to conduct small-scale microstructure experiments in basic science research,which lays a manufacturing foundation for the exploration of related fields.