Preparation And Process Optimization Of Multi-layer Visible Light Antireflective Film On Glass Substrate Of Micro-LED Display

Micro-LED has the characteristics of high brightness,high contrast,low feedback time and long service life,which has broad application prospects in display,communication,medical treatment,military and other fields.Due to the high reflectivity of the micro-LED glass cover surface,the luminous efficiency of the screen is affected.In large-size splicing,due to the different production batches of circuit board,there may be color difference in micro-LED splicing screen,which will affect the user experience.In the daily use of the screen,it is inevitable to bump and scratch,which may cause damage to the screen surface.In order to improve the screen problems of micro-LED,Cr/SiO2/Cr/SiO2/Cr/SiO2 structure films with selective absorption of visible light in 400nm-700nm band were prepared by pulse magnetron sputtering technology on the surface of silicate glass substrate.The reflectivity of glass surface in 400nm-700nm band is decreased,and the hardness of glass cover plate is improved.In the experiment,the composition materials and structure of the multilayer were designed first.The Essential Macleod optical film analysis software was used to optimize the structure of the multilayer,and the multilayer with the same structure was prepared under different process parameters.Visible light spectrophotometer,atomic force microscope and microhardness tester were used to characterize the film prepared experimentally.Then,the effects of the current intensity of the target power supply,the duty ratio of the target power supply and the flow ratio of argon and oxygen on the performance of the multilayer were investigated.On the basis of single factor experiment,the choice of the multilayer film microhardness biggest influence Si target power current,Si target power duty ratio and argon oxygen flow rate than the three factors,the coating microhardness as the optimization goal,designs the three factors three levels of response surface experiment of multilayer minus reflection membrane preparation process was optimized,validation and get the optimal process,The highest microhardness multilayer antireflection film was prepared.Experimental study of film layer structure as Cr1.9nm/SiO255.6nm/Cr1.9nm/SiO253.6 nm/Cr2.2nm/SiO273.4nm,the experimental results show that the deposition rate of the film increases gradually with the increase of the current intensity of the target power supply and the flow ratio of argon and oxygen,and the appropriate adjustment of the duty ratio of the target power supply can also improve the deposition rate of the film.The results show that the optimum microhardness of multilayer is between Si target current ISi=20A and ISi=24A.The results show that the optimum microhardness of multilayer films is between δSi=40%andδSi=60%when the duty cycle of Si target power supply is compared.By comparing the effects of different argon oxygen flow ratios on the properties of multilayer films,it is found that the optimal microhardness of multilayer films occurs between argon oxygen flow ratios of 1.0-1.6.Response surface methodology（RSM）was used to optimize the preparation parameters of multilayer antireflection films.The optimization results show that the microhardness of multilayer antireflection films is 827.066HV when the Si target power current is 21.1A,the Si target power duty ratio is 51%and the argon flow ratio is 1.318.The optimized results were verified by this process,and the multilayer antireflective film with microhardness up to 830.2HV was prepared.