Preparation And Properties Of TiO₂ Dense Films And MAF-66 Films

Dense metal oxide film is an important part of optoelectronic devices.Metal organic framework(MOFs)films have great application prospects in some fields due to their large specific surface area and unsaturated coordination bonds.In this thesis,the vacuum ultraviolet technology and electrodeposition methods were employed to prepare dense titanium dioxide films and metal azoate framework films,respectively,and the application of the prepared films in the dense layer of dye-sensitized solar cells and removing metal ions from water was explored.The main research work was as follow:Due to its high photon energy,vacuum ultraviolet light can break most of the carbon-contained organic bonds in organic compounds.We used vacuum ultraviolet light to irradiate isopropyl titanate sol-gel thin films to prepare titanium oxide thin films.The influence of irradiation time on the morphologies of the films was studied,and the irradiation time was optimized as 2 h to obtain a flat and dense TiO₂thin film.We assembled it as a dense layer into a dye-sensitized solar cell,and compared it with a dense layer of TiO₂prepared by sintering at 450?without a dense layer.The dense layer made by the vacuum ultraviolet technology can increase the electronic recombination resistance between the FTO/porous TiO₂film electrode interface,to suppress the electronic recombination at the thin film electrode interface,and prolonge the life of photogenerated electrons.To a certain extent,the dark current inside the battery was reduced,and the short-circuit photocurrent density and photoelectric conversion efficiency of the battery were improved.The vacuum ultraviolet light technology can avoid the high-temperature sintering process,is a low-temperature preparation method of metal oxide thin films,and has an potential application in the preparation of flexible devices.We designed a cathodic electrodeposition deposition method to prepare MAF-66thin film.By reducing oxygen on the surface of the FTO electrode to form OH^-,a stable solution component for continuous preparation of MAF-66 was obtained on the electrode surface in an electrolyte containing ligands and zinc ions.MAF-66 grew on a conductive glass substrate to form a porous thin film.The particle size and thickness of the MAF-66 thin film were adjusted by controlling the deposition time.The longer the deposition time,the larger the MAF-66 particle size and the thicker the film.When it was used as an adsorbent to remove trace amounts of Cd²⁺,the deposited MAF-66 film has good adsorption capacity.In a 24 ppm Cd²⁺solution,the deposited film can adsorb up to 32.3 mg/g(Removal of 69%),the adsorption and desorption can not affect the structure of MAF-66,indicating that the film has good stability.