Preparation And Performance Study Of Al-Based Energy-Containing Films

With the development of in-line detonation sequences,the performance requirements for insensitive detonators have become increasingly high.As one of the most widely used insensitive electric detonators,the development of energetic thin films for their initial ignition components has become a top priority.Due to the presence of thermite and alloying reactions,Al based energetic thin films have become the focus of research in various military units.In this paper,four kinds of energetic thin films,namely,Al/Ni,Al/Ti,Al/Cu,and Al/CuO,were designed and prepared.High voltage detonating power supplies were designed,and a testing system was established.Four kinds of Al based energetic thin films were subjected to electrical explosion tests.The matching law between the energy utilization rate and the electrical explosion effect of the energetic thin films was obtained,which has theoretical reference value for the industrial application of energetic thin films.The modulation period,modulation ratio,and bridge region shape of Al based energetic thin films were designed.Firstly,the modulation ratios of four Al based energetic thin films were designed by numerical calculation;Then,four different bridge shapes are designed,and the electrothermal evolution process of aluminum metal films with different bridge shapes is simulated using COMSOL simulation software.The results show that the square bridge region has a slow heating rate,but the temperature distribution is average.Without considering the bridge region phase transition,the average temperature in the bridge region can reach 1020 K in 0.1 microseconds.Conduct an electrical explosion test on aluminum metal thin films with an input voltage of 400 V to 900 V and a gradient of 100 V.After the test,comparing the physical and simulation results of the metal thin films,it was found that the damage condition of the physical bridge area can be compared to the temperature nephogram of the simulation results,but there is a "corner effect" between the square bridge area and the bridge wing.Adding a chamfer at the connection between the bridge area and the bridge wing is compared to the case without adding a chamfer.The simulation results show that adding a 0.17 mm chamfer can minimize the impact of "corner effect".Energetic thin films were prepared using magnetron sputtering and pattern inversion techniques.Four types of Al based energetic thin films,including 0.10 mm,0.15 mm,0.20 mm,and 0.23 mm bridge regions,were prepared by setting process conditions.The microstructure,material elements,and square resistance of the prepared energetic thin films were characterized.The results showed that the four kinds of energetic thin films were dense,had low surface roughness,low impurity content,and had an average resistance distribution,meeting the needs of subsequent experiments.A high-voltage detonating power supply suitable for the volt-ampere characteristic test of energetic thin films was designed and constructed.MCT switches suitable for 0～3000V were selected as trigger switches with a capacity of 0.1μF.A high-voltage capacitor with a withstand voltage value of 4000 V is used as an energy storage element,and the control method is remote control by a host computer.The short circuit current cycle T of the high-voltage initiation power supply tested is approximately 0.413μs.The initial inductance of the circuit is 58.72 nH,and the initial resistance is 556.57mΩ,which meets the use requirements.A test system for energetic thin films was established.The volt-ampere characteristics of four bridge size Al/Ni,Al/Ti,Al/Cu,and Al/CuO energetic thin films were tested with an input voltage ranging from 400 V to 1500 V and a gradient of 100 V.The peak current,peak voltage,and initiation time of the electric detonation were obtained.At the same time,the explosive process of the energetic thin film was recorded using a high-speed camera.The parameters such as deposition energy and energy utilization of four Al based energetic thin films were calculated and analyzed in combination with the electrical explosion process captured by high-speed photography.The "jump" phenomenon of explosive energy and energy utilization of energetic thin films was found.By comparing and analyzing the calculated parameters with the actual electrical explosion of the energetic thin film at various input voltages,it is concluded that when the deposition energy of the energetic thin film undergoes a "jump",the input voltage roughly corresponds to the input voltage at which the bridge region fully explodes.Based on this rule,it can guide the matching design of the electrical explosion degree and input voltage in the energetic thin film bridge region.