Magnetic pole - Globe Thesis

Keyword [Magnetic pole] Result: 1 - 20 \| Page: 1 of 1
1.	Development Of Permanent Magnetic Poles Based On Freeform Surface Finishing And Experimental Studies On Their Working Performance
2.	The Exploitation Of Strong Permanent Magnetic Poles On Plane Surface And The Experiment Research On Its Working Character
3.	Study And Simulation Of The Micro-workpiece Magnetic Abrasive Finishing Using A Circling Magnetic Pole System
4.	Study Of The Micro-workpiece Magnetic Abrasive Finishing Using A Circling Magnetic Pole System
5.	Surface Digital Magnetic Abrasive Machining Technology Basic Research
6.	Research On Ultrasonic Assisted Magnetic Abrasive (?)nishing Of Engieering Ceramics
7.	Magnetic Abrasive Finishing Mechanism And Experimental Study For Nickel-based Superalloy
8.	Low-speed Permanent-magnet Submersible Motor's Design And Structural Analysis
9.	Experimental Investigation Of Rotating Magnetic Pole Grinding Of Inner Surface By Magnetic Abrasive Finishing
10.	Design Of Magnetic Circuit Of Permanent-electro Magnetic Clamping And Feasibility Study Of Its Application In Deep Drawing Process
11.	Research On Torque Ripple Characteristics Of Permanent Magnet Synchronous Servo Motor For CNC Machine Tools
12.	Study On Mechanism And Experiment Of Ceramics Materials Using Magnetic Abrasives Finishing
13.	Research On Magnetic Content Testing Equipment
14.	Optimization Design Of Magnetic Pole Array Scheme And Experimental Research Based On Magnetic Polishing
15.	Experimental Study On Polishing Internal Surface Of Quartz Glass Tube By Ultrasonic Magnetic Abrasive Finishing
16.	Research On Several Problems Of Magnetic Polishing Of Drag Reduction Structured Surface
17.	Study On Precision Grinding Process Of Quartz Glass Tube Internal Surface
18.	Study On Optical/Electrical Properties Of Al/GaAs Metamaterial Hot Electron Detector
19.	Research On Magnetic Abrasive Finishing Process Of AlSi10Mg Alloy Curved Surface Formed By Selective Laser Melting
20.	Optimization Of Dynamic Cluster Magnetorheological Polishing Parameters Based On Improving The Processing Uniformity Of Optoelectronic Wafers
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