nitride films - Globe Thesis

Keyword [nitride films] Result: 61 - 80 \| Page: 4 of 5
61.	Growth of gallium nitride and indium nitride films and nanostructured materials by hydride-metalorganic vapor phase epitaxy
62.	Preparation and characterization of thin, atomically clean gallium nitride(0001) and aluminum nitride(0001) films and the deposition of thick gallium nitride films via iodine vapor phase growth
63.	The chemistry and surface microstructure of silicon-based substrates and their effect on the evolution of the microstructures of III-nitride films grown via metalorganic vapor phase epitaxy
64.	Epitaxial Deposition of Low-Defect Aluminum Nitride and Aluminum Gallium Nitride Films
65.	Atomic Layer Deposition and Direct-Liquid-Injection Chemical Vapor Deposition of Nickel Nitride Films and Their Conversion to Nickel Silicide Films
66.	Copper diffusion barrier performance of tantalum nitride films deposited by the chemical vapor deposition technique
67.	Crystallization of diamond and diamond-like nitride films from gas phase
68.	Chemical bonding in hard and elastic amorphous carbon-nitride films
69.	Investigation of optical band gap and optical phonons in indium nitride and indium aluminum nitride films
70.	Novel slurry formulations and associated mechanisms for chemical mechanical polishing of polysilicon, silicon dioxide and silicon nitride films in microelectronic applications
71.	Growth and critical layer thickness determination of indium gallium nitride films grown on gallium nitride
72.	Investigation of thermal conductivity in silicon nanostructures and gallium nitride films
73.	Chemical vapor deposition of nitrides for electronic device applications
74.	Multi-length scale analysis of chemical vapor deposition (CVD) of diamond and titanium nitride films
75.	III-Nitride semiconductor films and device structures grown by low-pressure MOCVD
76.	Tantalum and tantalum nitride films grown by inorganic low-temperature chemical vapor deposition for copper metallization: Chemistry, process, and material development and characterization
77.	Optical properties and residual stress in group III-V nitride films
78.	Growth, characterization and processing of gallium nitride films for high temperature electronics and optoelectronics in blue to UV
79.	The chemical vapor deposition of polycrystalline silicon nitride films at low temperatures
80.	Plasma assisted synthesis and physical chemical characterization of titanium-nitride films
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