Optical Dielectric Thin Film Working Under Ultrashort Pulse

Eversince the invention of the lasers, the lasers have been driven towards high power, wide coverage range of wavelength, short pulse duration, solidification and miniaturization. At present, lasers have been applied to most fields of national economy, national defense and people's daily life. In recent years, one of the most noticeable achievements is the rapid development of the ultrashort pulse technology in laser science and technology. Since there are many optical components, which involve a great deal of optical thin films, the interaction between ultra-short pulse and optical dielectric & optical thin film has attracted intensive attention. Generally speaking, the interaction involves the influence of dielectric and thin film on optical pulse, and the influence of optical pulse on dielectric and thin film. When an ultrashort pulse irradiates the optical dielectric thin film, the phase shift experienced by the pulse during the transmission and upon reflection from the mirror is more important, because it directly influences the pulse shape. Because of the distribution characteristics, dispersion and reflection delay of multilayer stacks can influence pulse width, leading to distortion. Study on the reflection, transmission and phase characteristics of optical dielectric thin film can help to compensate the dispersion of the ultrashort pulse more effectively, control the ultrashort characteristics more effectively and generate shorter ultrashort pulse by utilizing negative dispersion effect of dielectric film stack. In addition, as the peak power of the ultrashort pulse...