Font Size: a A A

Study On Synthesis Of Photoresist And Photochemical Process For Information Recording In Laser Disc

Posted on:1999-03-27Degree:DoctorType:Dissertation
Country:ChinaCandidate:J WeiFull Text:PDF
GTID:1101360185987538Subject:Fine chemicals
Abstract/Summary:PDF Full Text Request
Recent years, as rapid development of modern science and technology, today's information storing material can not meet the needs of intensely increasing amount of information. Laser optical disc is a kind of advanced recording material which has higher storing density, high definition and higher fidelity, manipulated transmit, longer duration, and cheaper than other storing medium. The birth of the laser optical disc is a great success in the development of information recording materials.In this dissertation the photoresist, the key material for manufacture of the laser recording original(mother) disc was studied. It can be used for making micro electric devices, ultra large scale integration of high resolution and lithography. An intense focused monochromatic Ar~+ laser light was used for exposure of the photoresist.The positive-working photoresist is composed of diazonaphthoquinone agent binder resin, solvent and other additives. The diazonaphthoquinone agent are esters which are obtained by the condensation of 1,2-naphthoquinonediazide with novolac, polyhydroxybenzophenone,polyhydroxy-silicon-compound and polyhyoxyanthriquinone in different conditions. The chemical structure, molecular weight distribution of the diazonaphthoquinone agent were characterized by FI-IR, UV-VIS, HPLC and GPC. Some photosensitizers such as coumarin were synthesized and used in the system in order to enlarge and shift the light absorbance to the visible region to 488nm, so as to have good response to the Ar~+ larger exposure.The photoresist was exposured by UV light. The photodecomposition reaction of resist was studied. The characteristic curve, relative sensitivity, resolution were measured. The quantum yield of the reaction is 0.36~0.73. It was determined by chemical analysis and kinetic method. The resolution is <1μm, photosensitivity ≤100mJ/cm~2.In the work, the laser-behavior under exposure of Ar~+ laser was discussed. The kinetic process of photochemical reaction, intermediate, sensitive process of diazophthoquinon system were studied by laser fluorescence spectrum and laser induced fluorescence attenuation. The nonlinear relation between photodecomposition rate of the system and laser power and concentration of solution was investigated in detail. The...
Keywords/Search Tags:Laser optical disc, Positive-photoresist, Sensitizer, Laser induced fluorescence attenuation
PDF Full Text Request
Related items