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Theoretical Studies On The Oxidation Pattern Of Silicon Clusters

Posted on:2007-12-14Degree:DoctorType:Dissertation
Country:ChinaCandidate:Q J ZangFull Text:PDF
GTID:1101360212456673Subject:Inorganic Chemistry
Abstract/Summary:PDF Full Text Request
Due to the importance of silicon oxide materials in science and technology and the important role of silicon oxide in the recent chemical vapor deposition growth of silicon nanowires and nanostructures, silicon oxide clusters have attracted more and more attention both from experimental and theoretical studies in recent years.Using photoelectron spectroscopy, small anionic silicon oxide clusters such as Si3On (n = 1 - 6) has been investigated by Wang and co-workers. Their results provide very useful information on the electronic properties and structure assignment of these small Si3On clusters. Experimental studies of reaction of silicon clusters with oxygen have been performed by Creasy et al. and by Jarrold et al. Creasy and co-workers studied the reactions of cationic silicon clusters containing up to six atoms with oxygen. Their study shows that the small cationic silicon clusters were etched away by the oxidation reaction, two silicon atoms at a time, all the way down to Si2+ or Si+. Jarrold et al. studied the chemical reactions of medium-sized ionic silicon clusters, Sin+ (n = 10 - 65) with oxygen. Their experimental results suggested that for clusters containing fewer than 29 atoms, the main products were found to be Sin-2+ and two SiO molecules. Each reaction of an oxygen molecule with the silicon cluster results in the loss of two Si atoms in two SiO radicals. Bergeron and Castleman, Jr. has also studied the stability of silicon cluster ions by O2 etching, suggesting that Sin+ (n = 4, 6, 9, 13, 14, and 23) and Sin- (n = 18, 21, 24, 25, and 28) have very large stability. Recently, the experimental study on the oxidation of the Si nanostructures has also been performed, suggesting that the reactivity of oxygen with Si nanostructures is relatively low, and imposes some restriction on the oxidation of Si films.On the theory side, ab initio calculations of small SinOm with n≤5 clusters have been carried out to study the structures and potential energy surfaces of small silicon oxide clusters in great detail. Chelikowsky and co-workers have investigated the geometric structures and electronic properties of neutral and charged SinOn (n = 3, 4 and 5) clusters. Their computational results suggested that buckled rings are more stable than planar ones for Si4O4 and Si5O5. Lu et al. have studied systematically the structures and fragmentation stabilities of SimOn (m = 1 - 5, n = 1...
Keywords/Search Tags:Silicon Oxide Clusters, Structure, Stability, Electronic Properties, Fragmentation Energy
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