Fabrication And Hydrophility Research Of Titanium Dioxide Films By Magnetron Sputtering

This research use magnetron sputtering to prepare hydrophilia TiO2 thin film, and use HITACHI U-2800 Ultraviolet Visible Light Splitting Photometer,X Ray Diffraction Analyzer,Atom Force Microscope,ALPHA-STEP500 and Stepped Instrument Characterize to analyze preparing technological parameter, as total air pressure,oxygen pressure and working temperature. This processing parameters effect on thin film's performance and structure. Using finite element method, emulating Magnetic field distribution of magnetron target Magnetic field distribution regular pattern of magnetron target is gained. It modifies structural parameter of magnetron sputter target, generals merits and demerits of magnetron sputter target, optimizes and modifies design of target and analysis magnetron sputter target magnetic parameter effecting on film forming during the processing of TiO2 thin film. At the same time it discusses TiO2 surface energy influencing mechanics on TiO2 thin film's hydrophilia.This paper discusses the influence of air pressure during TiO2 thin film growing. With total air pressure increasing and target sputtering speed decreasing, the structure of TiO2 film's crystal is anatase phase, and the surface roughness of TiO2 thin film changes from coarse to minute. With total air pressure increasing, the structure of thin film's crystal also gets some changes. Thin film's transmission low valley shift to the direction of long wave. With total air pressure increasing, the contact angle gets smaller and smaller. When the air pressure reaches about 2.5 Pa, the contact angle gets close to minimum value, and gets the best hydrophilicity. As the total air pressure continues increasing, the contact angle gradually grows worse.This paper opens out that TiO2 thin film absorbs more longer wave length as oxygen flux grows; the deposition rate decreases as oxygen flux grows; When the oxygen flux is 40sccm, the thin film has both anatase phase and rutile phase; When the oxygen flux is 40sccm, the surface of thin film is compact and smooth; the change of oxygen flux has little influence on thin film's crystal morphology. Though columnar crystal's structure warps a little, there isn't basic change as a whole; with the oxygen flux changing, the hydrophilia of thin film changes. Its hydrophilic angle lowers a little. When the oxygen flux grows to some point, the hydrophilic has no obvious changes which means hydrophilia changes no more.TiO2 deposition rate increases while temperature raising during film forming. High temperature phase's and low temperature phase's growing don't have direct ratio to temperature during AC(median frequency) magnetron sputtering preparing TiO2 thin film. At a low temperature environment, we can also get rutile phase.With temperature raising, thin film tends to crystallize and the grain grows bigger gradually. Reasonable base temperature is good for thin film hydrophilic as a whole. Temperature has little influence on TiO2 thin film sample's light absorbing.With depositing time going, light absorbing changes little and thin film's hydrophilia grows much bigger on the condition. Amorphous TiO2 in the thin film hasn't changed into anatase phase or rutile phase while depositing for a short time. With depositing going, thickness grows deeper and deeper. Anatase phase appears in the TiO2 film. Then diffraction peak get intensified as thickness gets deeper, and rutile phase's crystal appears.With time going, blow-up on the surface becomes more obvious, and finally becomes giant which increases the surface area. With coating time going, thin film's columnar crystal obviously becomes thicker and longer, especially columnar crystal end.Using finite element method, emulating Magnetic field distribution of magnetron target Magnetic field distribution regular pattern of magnetron target is gained. Calculation result indicates that partial area of Magnetic field distribution is non-uniform and it could be certified by experiment of retarding regression line.This kind of Magnetic field distribution makes the glow discharge unbalanced in the plasma field during the working of target. The phragmosome character shifts when the thin film forms on the substrate and the expected result disappearances.It modifies structural parameter of magnetron sputter target and does series of new emulating, generals merits and demerits of magnetron sputter target, optimizes and modifies design of target, checks modified magnetron target Magnetic field distribution regular pattern and analysis magnetron sputter target magnetic parameter effecting on film forming during the processing of TiO2 thin film.This study based on the concept of solid surface energy and different types of crystals' surface energy calculating method. The paper analyzes YGGE theory, acid-base action theory in detail. Using the contact angle which has been got, it applies surface energy theory for the first time to calculate and analyze TiO2 surface energy. And it theoretically analyzes the reason of roughness influencing on surface energy. It also uses surface energy theory to generalize TiO2 thin film's hydrophilia which was very important for hydrophilia.This experiment indicates that median frequency reacting sputter is a good method to prepare TiaO2 thin film.hydrophile TiO2 thin film can be prepared by applying reacting sputter. This kind of TiO2 thin film can reduce the contact angle between water and TiO2 thin film after ultraviolet light shining. Under some conditions, thin film technology has deciding effect on thin film's hydrophilia. The analysis on experiment shows that TiO2 thin film's hydrophilia is not only related to surface pattern and inner energy band, but also related to TiO2 thin film's crystal grain structure. Experimental analysis indicates that not only thin film's preparation processing parameter influences on hydrophilia thin film's preparation critically, but also preparation equipment and special magnetic parameter of preparation magnetron sputter targe effect on hydrophilia thin film's preparation significantlyThis paper explores deeply into TiO2 thin film's preparation processing parameteron, magnetic parameter of preparation magnetron sputter target and TiO2 thin film's hydrophilia on the basis of experiment. It gets some methods and laws on TiO2 thin film's hydrophilia study which has important reference value for thin films hydrophilia further study.