Research On The Technology Of The Large Curvature Sagittal Focusing Crystal Monochromator And Multilayer Monochromator

Synchrotron radiation source has been widely used in many fields as an essential instrument for its excellent character. There are more and more experiment need higher photon fluxes. In order to get higher photon intensity, some systemic research on key technology of the large curvature sagittal focusing monochromator for dynamical energy scanning by support of NSRL-XAFS beamline upgrading project and multilayer for synchrotron white beam based on ESRF study of the multilayer. Design, manufacture, examining and application of the key part of the large curvature sagittal focusing crystal monochromator were done. Thermal deformation of the multilayer for white beam that study at ID06 of ESRF was researched.1. Research on the sagittal focusing crystal monochromator and related technology There was small influence on the diffraction efficiency of the first crystal thermal deformation with or without water cooling, and the slope error within the required of experiments when the light spot drift on the crystal. The author introduced the principle how the bended crystal produce the anticlastic deformation and made finite analysis. design and outline measurement of the stiffening ribs, the golden value and slabs slot-cut, which were used to minimize the anticlastic distortion. We got much useful data and supply stronger warrant to the study of the large curvature sagittal focusing monochromator.2. Development of assembly sagittal focusing crystals with large curvatures For the bending radius under 1m, the tensile stresses of the crystal were comparable to the failure tensile stresses. An assembly crystal which cements the silicon strips with the tops of titanium stiffening ribs was designed and its slope error were evaluated by finite element analysis and were measured with LTP. The focusing properties and the bending stability of the assembly crystal were measured by laser beamline. The author calculated the diffraction of the assembly crystal and measured the light drift when cured the crystal model.3. Research of the multilayer monochromator The multilayer monochromators for synchrotron beamline are usually produced by magnetron and ion beam sputter deposition. Long trace profiler, atomic force microscope and transmission electron microscopy were used to measure the curvature and roughness of multilayers. The important imperfections in multilayers are random or pseudo-random variations in the thicknesses of layers due to changes in deposition rates, deviations from perfect flatness in the surface of the substrate, microscopic or macroscopic surface roughness in the layers and diffusion between layers. Based on cooling optimization, the top-side cooling of the multilayer substrate is the best choice. The slope error of the multilayer substrate with smart cross section is greatly reduced, which because there is no temperature gradient in the thickness.Some conclusions could be made, which were shown as follows: The slope error of the model that minimize the anticlastic distortion when bending the crystal was less than the Darwin width of the crystal; Compared the double plane crystal, the intensity of the large curvature sagittal focusing monochromator focus the light on the sample increased one order of magnitude; The thermal slope error of the multilayer substrate wKietyh swmoarrdt cs:r o Sssa gseitcttailo nf oisc ulesisnsg t h amno n0o.6chμrroamd ator, slope error, anticlastic distortion,...