The Application Of Plasma Surface Modification Technology On Cutting Tools

Hard films have been widely used in mechanical industry, semiconductor manufacturing and automobile industry. In recent years, nano-multilayer hard coating films are better than traditional hard coating films on wear resistance and stability and become the hot points of academic research and industrial applications.Plasma surface coating technology has a good potential application in improving coating tools life and efficiency. Ion implantation is due to the ion energy and dose injected into the target, in order to modify the electrical, mechanical, physical and chemical characters of raw materials. This technique has been used for the deposition of Diamond-like carbon (DLC) film. We used plasma ion implantation and deposition equipments on cutting tools to make nanometer multilayer film, choosing Ar and methane gas as working gases. By adjusting the bias, Ar and methane gas volume ratio, pulse width and frequency, processing parameters on performance of films, plasma immersion ion implantation and deposition preparation of nanometer multilayer films are discussed. The film surface morphology, hardness, bonding, adhesive strength and performance are studied also. For the modified system of chemical composition, microstructure and mechanical properties of improvement were investigated, and the strengthening mechanism was discussed.Cathodic arc deposition technique has high ionization rate, fast deposition speed, can use the alloy target material advantages, in recent years the technology has developed the system hardware and the commercial coating technology. This paper introduces the new development of cathodic arc deposition system, preparation of nanometer multilayer structures of titanium aluminium nitride (TiAlN) film on the microstructure, mechanical properties and industrial application. The magnetic field and metal cages were used to improve this process.Then, two methods of making carbon films:(1) filtered cathodic arc deposition;(2) the RF plasma deposition, arc obtained for different SP3/SP2ratio of single layer and multilayer structure of carbon films. Under controlled conditions, the total stress is maintained at an acceptable level. A control layer can stop the film breaks. Raman spectroscopy, scanning electron microscopy and atomic force microscopy are employed on these structures.