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The computational studies on the chemistry of titanium dioxide nanoparticles

Posted on:2011-03-11Degree:Ph.DType:Dissertation
University:The University of AlabamaCandidate:Wang, Tsang-HsiuFull Text:PDF
GTID:1441390002454478Subject:Chemistry
Abstract/Summary:
The chemistry of TiO2 and SiO2 nanoclusters is studied using computational methods. The potential energy surfaces (PESs), thermochemistry of the intermediates, and the reaction paths for the initial steps of the hydrolysis of TiCl4 were calculated. Transition state theory and RRKM unimolecular rate theory are used to predict the rate constants. Clustering energies and heats of formation are calculated for neutral clusters, and the calculated heats of formation were used to study condensation reactions. The reaction energy is substantially endothermic if more than 2 HCl are eliminated. The calculations show that the reported values for DeltaHf 0(TiOCl2) should be remeasured. Transition metal oxides such as TiO2 can be used as photocatalysts to control chemical transformations for energy production. An important applications for TiO 2 is its use to photochemically split water to produce H2 and O2. The PES for splitting water on the ground and first excited state surfaces of (TiO2)n (n=1-4) nanoparticles have been studied up through the coupled cluster CCSD(T)/complete basis set level. Water is readily split to form hydroxyl groups without the need for a photon. Experimental measurements of the photoconversion of ketones (C(O)RR') on the rutile TiO2 (110) surface show that one can eliminate R or R'. The bond dissociation energies of R=CH3 and a wide range of R' for the gemdiols CRR'(OH)2 were calculated at the density functional theory (DFT) and G3(MP2) levels. The calculated bond dissociation energies are in excellent agreement with the experimental values. The calculations show that most of the photodissociation processes are under thermodynamic control except for R'=CF3. X-ray photoelectron spectroscopy (XPS) and DFT electronic structure calculations were used to study the average formal oxidation state of silicon in fumed silica (CAB-O-SILRTM). The results show that the average surface oxidation state of the silicon in fumed silica is predominantly +1 and suggest a notably less hydrophilic character for CAB-O-SILRTM than the oxides of silicon with Si in the formal +3 and +4 oxidation states. Once the +3 oxidation state is formed, water on the silica surface facilitates the conversion of the Si +3 to the Si+4 oxidation state.
Keywords/Search Tags:Oxidation state, Surface, Water, Tio2
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