| Surface assemblies with small feature sizes are employed in microelectronics, sensing, optical and nanotechnology applications. The lithographic "top-down" technology now produces complex structures with feature sizes smaller than 50 nm (35 nm gate length and 45nm average half-pitch of a memory cell) i. Surface construction offers an alternate approach to the assembly of surface with small features by starting at the molecular level. Self-assembly and guided assembly of large and small molecules, polymers, biological entities, and nanoparticles constitute "bottom-up" construction methods.;Self-assembled monolayers (SAMs) are surfaces consisting of a single layer of molecules on a substrate. Unlike three dimensional self-assembly, SAMs extend in only two dimensions, which makes the third dimension available for surface construction. This availability has been very useful for some chemical and biochemical experiments.;STM (Scanning Tunneling Microscopy) is now an established tool for the study of ordered metal and semiconductor surfaces on the atomic scale. In this project, STM was used to study the self-assembly of simple and patterned monolayers at the HOPG surface. A series of anthracene derivatives and some triptycene analogs were designed and synthesized based on prior studies. The compounds were characterized by NMR, MS, HRMS and STM images of the monolayers they formed on graphite were obtained.;A theoretical model of monolayer patterning is described. The patterning can be controlled by the chain length and the position of various polar groups within the side chains. Specifically tailored interactions between these dipolar groups provide the "molecular recognition" required to drive patterned self-assembly of multi-component monolayers.;ihttp://www.intel.com/technology/45nm/index.htm?iid=homepage+tech _45nm... |
