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Surface morphology evolution of epitaxial TiN(001) layers grown by reactive magnetron sputtering

Posted on:1998-06-02Degree:Ph.DType:Dissertation
University:University of Illinois at Urbana-ChampaignCandidate:Karr, Brian WilliamFull Text:PDF
GTID:1461390014475316Subject:Engineering
Abstract/Summary:
The group IV-B transition metal nitride TiN is widely employed as a wear-resistant coating on mechanical components and as a diffusion barrier in microelectronic devices. I use the epitaxial growth of single crystal TiN as a model system for insight on the evolution of surface morphology and microstructure in more complex polycrystalline films. Atomically-flat MgO substrates, prepared by air annealing at 950...
Keywords/Search Tags:Tin
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