Surface morphology evolution of epitaxial TiN(001) layers grown by reactive magnetron sputtering |
Posted on:1998-06-02 | Degree:Ph.D | Type:Dissertation |
University:University of Illinois at Urbana-Champaign | Candidate:Karr, Brian William | Full Text:PDF |
GTID:1461390014475316 | Subject:Engineering |
Abstract/Summary: | |
The group IV-B transition metal nitride TiN is widely employed as a wear-resistant coating on mechanical components and as a diffusion barrier in microelectronic devices. I use the epitaxial growth of single crystal TiN as a model system for insight on the evolution of surface morphology and microstructure in more complex polycrystalline films. Atomically-flat MgO substrates, prepared by air annealing at 950... |
Keywords/Search Tags: | Tin |
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