Kinetics and mechanisms of metal silicide formation

Posted on:1995-10-28

Degree:Ph.D

Type:Dissertation

University:University of Illinois at Urbana-Champaign

Candidate:Ma, Zhiyong

Full Text:PDF

GTID:1471390014991814

Subject:Engineering

Abstract/Summary:

Kinetics and mechanisms of metastable (C49-TiSi;Microstructural study of the C49-TiSi;The effect of the C49-TiSi;Evolution of the Ti/a-Ge/Si trilayer reactions has been investigated using TEM and AES. The amorphous phase formation is eliminated by introducing an a-Ge interlayer. The crystalline Ti...

Keywords/Search Tags:

Mechanisms

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