Metalorganic chemical vapor deposition (MOCVD) is potentially a viable technique in the deposition of high temperature superconductors and related materials. This research demonstrates that high quality YBCO superconducting thin films can be successfully deposited on various substrates with the MOCVD technique using furnace processing, in-situ rapid isothermal processing (RIP), plasma excited RIP, and photon-enhanced RIP. RIP based on incoherent light radiation as the energy source is emerging as a practical alternative to furnace processing. In addition to the well established short time processing feature, RIP can also be used as a reduced substrate temperature processing technique. The objective of this research is to prepare high current density YBCO superconducting thin films as required for microelectronics, using thermal budget processing and dielectric buffer layers on silicon and related substrates. The results presented in this research clearly show that photon-enhanced RIP MOCVD can be used to reproducibly grow highly oriented YBCO films on YSZ, and SrTiO... |