Font Size: a A A

Physics of the current injection process during localized helicity injection

Posted on:2016-04-25Degree:Ph.DType:Dissertation
University:The University of Wisconsin - MadisonCandidate:Hinson, Edward ThomasFull Text:PDF
GTID:1471390017976276Subject:Plasma physics
Abstract/Summary:
An impedance model has been developed for the arc-plasma cathode electron current source used in localized helicity injection tokamak startup. According to this model, a potential double layer (DL) is established between the high-density arc plasma (narc ∼ 1021 m-3) in the electron source, and the less-dense external tokamak edge plasma (nedge ∼ 10 18 m-3) into which current is injected. The DL launches an electron beam at the applied voltage with cross-sectional area close to that of the source aperture: Ainj ≈ 2 cm 2. The injected current, Iinj, increases with applied voltage, Vinj, according to the standard DL scaling, Iinj ∼ V(3/2/ inj), until the more restrictive of two limits to beam density nb arises, producing Iinj ∼ V(1/2/inj), a scaling with beam drift velocity. For low external tokamak edge density nedge, space-charge neutralization of the intense electron beam restricts the injected beam density to nb ∼ nedge. At high Jinj and sufficient edge density, the injected current is limited by expansion of the DL sheath, which leads to nb ∼ narc. Measurements of narc, Iinj , nedge, Vinj, support these predicted scalings, and suggest narc as a viable control actuator for the source impedance. Magnetic probe signals ≈ 300 degrees toroidally from the injection location are consistent with expectations for a gyrating, coherent electron beam with a compact areal cross-section. Technological development of the source has allowed an extension of the favorable Iinj ∼ V(1/2/inj) to higher power without electrical breakdown.
Keywords/Search Tags:Current, Source, Injection, Electron
Related items