Research Of Photoelasticity For Residual Stress Measurement In Transparent Material

Residual stress measurement is an important problem in clear material at present. In this paper, some of the new progress of residual stress measurement in Clear material is described. The paper gives a review of photoelastic isodyne and integrated photoelasticity and of their application for residual stress measurement in transparent material. In these methods of measurement, phase-measuring technique is an important technique and photoelasticity patter analysis. As a result, approach to full-field automatic photoelasticity images is studied extensively. In the meantime, phase-measuring techniques has been employed in it. In this paper , a fundamental method about residual stress measurement has been obtained by theory of optic and digital images processing and some fundamental formula about photoelasticity technique has been deduced from the phase-shifting technique and optic theory. Having obtained the fundamental formula about photoelasticity technique, full-field photoelasticity experiment has been conducted. After having gotten preferable results, the author analyze the feasibility and availability of the technique and verify that this technique is very significance for application in residual stress measurement of Clear material. For the demands of experiments and analysis, the pertinent application programs of every analyzing step have been developed and software system of this technique is set up. A robust technique for automatic analysis of the images has been described and demonstrated. It is very significance for the field of residual stress measurement and full-field analysis.