Study On Sputtering Of Ag,Au,Mo,Mica And SiO₂ Surface By Pb～(q+),Ar～(q+) Ions

Slow highly charged ion (SHCI) beams are widely used in various applications. But the current views of the interaction of SHCI with material surfaces are not in complete agreement. In this work, the sputtering of Pb^q+, Ar^q+ on Ag, Au, Mo, Mica and SiO₂ surfaces were studied verus ion energy, incidence angle and charged states of ions.Our study based on Ar^q+(q=8-16, E_k=8q-16q keV) and Pb^q+(q=20-36, E_k=6q-20q keV) ions produced by the ECR source platform of the Heavy Ion Research Facility at Lanzhou(HIRFL) in the Institute of Modern Physics, the Chinese academy of science(IMPCAS). A multi channel plate detector and beam integrator were employed to measure the relative yield of sputtering.It is found that the relative yield of each target increases with increasing incidence angle, whatever the ion beam has different charge state(Ar¹⁶⁺, Pb³⁶⁺) or different initial energy (Ar 160 keV, Pb 400 keV). Considering the kinetic energy effect, for the same target with different beams (Ar¹⁶⁺, Pb³⁶⁺) the relationship of relative yield and V/ V_Bohr are different, the yield for the case of Ar¹⁶⁺ decreases with velocity of projectile, while the yield of Pb³⁶⁺ case increases. Maybe there is a resonance in the region between 0.3 V/ V_Bohr and 0.4 V/V_Bohr, in this interval the surface and the projectile occur resonance. Furthermore SHCI has a potential energy effect, the sputtering yield of Ar^q+(160 keV) increases with increasing charge state, a strong sputtering enhancement has been observed while the charged state of Pb^q+(400keV) is above 30+.