Study On Deposition And Properties Of Carbon Nanotubes Fabricated By RF-PECVD

Carbon nanotubes have perfect characterof mechanical, thermal and electrical properties.Since it is discoveried in 1991 by Lijima, carbon nanotubes has received extensive attention. Because of it's excellent field emission properties ,carbon nanotubes is being expected a great potential for application of carbon nanotube field-effect transistors, field emission displays, single-electron transistors and other nano-electronic devices and integrated circuits as interconnects and so on. But to be product these electronic devices, carbon nanotubes must be synthesised below the temperature of the substrate material can bear. For example, the carbon nanotubes will be used in cold cathode flat panel displays as field emission sources, and the synthesis temperature of carbon nanotubes display should be lower than the glass transition temperature of 550℃. However, the growth temperature of CNTs is generally in the 800 ~ 1000℃, much higher than the transition temperature of metal Cu ,which commonly used integrated circuits and display the melting point. Therefore, in such high temperature conditions,even a single CNTs nanoelectronic devices can be synthesized, it is also difficult to achieve highly compatible between CNTs nanoelectronic devices traditional microelectronic processes. Plasma-enhanced chemical vapor deposition has a great advantage in synthesising carbon nanotubes at low temperature.This paper studies the growth and structural properties of carbon nanotubes .The work had been done by the following aspects:(1)Deposite Ni thin films on Si substrate by magnetron sputtering method.Using PECVD,prepared thin film of carbon nanotubes on Ni films. Studied the influnces of the substrates' temperature using SEM and Raman.(2)Using ion beam sputtering method,prepared Fe films on Si substrate, and then obtained carbon nanotubes on the Fe film by PECVD. The films were analyzed by SEM, HRTEM and Raman.(3) Deposite Ni thin films on Cu substrate by magnetron sputtering method,and then prepared thin film of carbon nanotubes on Ni films in a particular reaction conditions by PECVD. Using SEM and Raman conducted a preliminary analysis of the film.In conclusion, we analyzed the structural characteristics of carbon nanotubes through a series of tests.The results showed that the substrate temperature of 700 ~ 800℃condition is more suitable for growth of carbon nanotubes.