Font Size: a A A

Research On Chemical-Mechanical Palarization Process Of Functional Ceramics Based On LIF Technology

Posted on:2005-01-23Degree:MasterType:Thesis
Country:ChinaCandidate:M ChangFull Text:PDF
GTID:2121360122481212Subject:Mechanical and electrical engineering
Abstract/Summary:PDF Full Text Request
With the rapid development of material science and the advancement of optical-mechanical-electrical integrated technology, the various functional ceramics materials are widely used in the fields such as electrical computer, laser, communication, timing, and it integrates the advanced technology such as contemporary mechanism, optical, electrics, computer, measurement and material. So it has become the important symbol of development level of national science technology. Because of the special purpose of functional ceramics, the high requirement of performance is synchronously necessary for electrical components and parts, and the stricter requirement is presented on the integrity and surface accuracy, or the ultra-smooth surface without damage and deterioration layer. If the traditional mechanical polishing method is adopted, the previous requirement cannot be reached. But CMP technology can obtain the glabrous and smooth plane in virtue of mechanical grinding and chemical eroding. So now it has become the leading technology of semiconductor machining industry.In the paper, the fundamental research on CMP process is done, and the practical application is experimented. The experimental results show that the CMP technology is advanced. CMP is a kind of ultra-precision machining technology. It can realize the material removal at nano-level finally. Though the chemical action and mechanical action are the main factors of the whole work-piece remove phenomenon, systemic research is absent of each action process and interaction each other. The paper studies on the slurry transport and its distribution under the test piece and the mixing of "new" and "old" slurry during CMP according to the technical process, technical parameters of CMP, and so on.By the combination of theoretic analysis and experiment, against the fundamental research on CMP process, it is presented that the fundamental research on the CMP process is carried adopting the optical measurement technology of laser induced fluorescence (LIF). So the machining quality and machining efficiency of functional ceramics material is increased, and the machining cost is decreased.
Keywords/Search Tags:chemical mechanical planarization(CMP), plane polishing, functional ceramics wafer, laser induced fluorescence (LIF)
PDF Full Text Request
Related items