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The Study Of Grow Diamond Thin Films In A Hot-filament CVD System

Posted on:2007-07-20Degree:MasterType:Thesis
Country:ChinaCandidate:G LiuFull Text:PDF
GTID:2121360182473378Subject:Materials science
Abstract/Summary:PDF Full Text Request
Hot-filament chemical vapor deposition (HFCVD) used widely in industry due to its high quality, simple equipment and low cost .the influence of the base vacuum in the growth chamber on diamond growth due to a different effect to the films in this paper. Our experiments have confirmed that well-faceted diamond films can be observed at a minimum base vacuum .The effect of decreasing filament temperature on growth of diamond films is reported .well-faceted diamond crystals can be synthesized at a low filament temperature in the range 1500-1700℃ by low-pressure hot-filament chemical vapor deposition with use of a CH4-H2 gas mixture .At a lower filament temperature of 1300℃ , although the morphology of the grains is ball-like in the films deposited. This paper reports on hot filament CVD diamond deposition onto steel using arc-plated chromium nitride (CrN) as the interlayer. Direct deposition of diamond onto steel leads to the formation of a non-adhering layer of graphitic soot covered by poor-quality diamond. However, if CrN and TiN coatings are used, diamond formation takes place. Adherent on CrN interlayer and good-quality diamond coatings are obtained on TiN interlayer after several hours of deposition at a substrate temperature as low as 650 ℃. Micro-Raman spectroscopy, scanning electron microscopy, X-ray diffraction using a Cu line source have been employed to study the phases, morphology, composition, quality etc of the grown diamond layers and the modified substrate interlayer. the result of the diamond coatings is discussed.
Keywords/Search Tags:Diamond films, Hot-filament chemical vapor deposition (HFCVD), the base vacuum, Filament temperature, 316 stainless steel, interlayer
PDF Full Text Request
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