A Study Of The Prossing Of The Nano-Surface On Disk Crystalline Glass Substrate

Firstly, the polishing mechanism of the disk crystalline glass substrate is discussed in detail by theory in the paper. In the micro view criterion, according to the viewpoint of energy balance, the brittle-to-ductile transition mechanism and the criterion of the crystalline glass is analyzed by the microscopic fracture mechanics, the dislocations piled-up, the micro- cracks theory, the mechanical chemical reaction and so on. Secondly, grinds to the planet type two-sided polishing machine throws the path to carry on the computer simulation, we thought the complex cycloid path guarantees the flatness and the surface roughness of the disk crystalline glass substrate.On the base of the theoretical analysis, we carry through the experimental study on polishing the disk crystalline glass substrate. Through the change two-sided buffing machine pressure and the speed parameter, the polishing fluid parameter and so on, we obtain the best craft parameter which the disk crystalline glass substrates are polished. The final processing sample is: Ra0.19nm, Wa0.31nm. After hopes Seagate and other companies to test, the sample answers the purpose.