The Research On TiN Films Deposited By Plasma Assisted Magnetron Sputtering At Low Temperature

Magnetron sputtering (M.S.) techniques have been widely used in the industry due to their high deposition rate and low processing temperature. With higher metal ionization and plasma density than magnetron sputtering, plasma assisted magnetron sputtering can deposit thin films with good property at low temperature. Therefore the study provides a new and effective technological solution to the surface modification of the components of temperature-sensitive materials such as bearing steels and makes great efforts in developing environmentally-protective surface modification technology. This paper managed to deposit TiN films with good properties on stainless steel using plasma and radio frequency (RF) assisted magnetron sputtering method below 150℃. The effects of processing parameters on the films properties, including RF power, anode linear ion source power, the flux of nitrogen etc, were studied. Meanwhile, with the optimized parameters and processing, TiN films has been deposited and its tribology character has been studied.The study revealed that plasma were the most critical factor of low temperature magnetron sputtering to deposit TiN films. Without RF plasma assisted, TiN films were dark purple. The introduction of RF made the color of films change to golden yellow TiN. The processing parameters such as nitrogen flux, negative bias voltage, deposition pressure have a noticeable effect on hardness, color, structure of the film. A proper and scientific control of processing parameters can improve the properties of TiN films. As anode linear ion source is applied, a separate ion bombardment can be realized and surface morphology, mechanical properties, crystallinity are significantly improved.The analysis of XRD and EDS reveal that the low temperature TiN films in this paper own typical TiN features. The results of hardness tests, tribological tests and indentation method show that the TiN films have good mechanical properties and perfect protection of substrate.The wear condition of TiN films show that due to surface smooth, fine grain size of magnetron sputtering, the corresponding courterpart has a small amount of wear, while the surface of arc ion plating TiN film has larger particles and roughness, so that the corresponding courterpart had a larger wear pattern. The surface topogragh and roughness of arc ion plating TiN films have been changed by different surface treatment. the result indicated:using 2000# sandpaper treatment and polishing the surface of TiN film, the adhesion membrane increased significantly.By comparative tribological tests of treated films and untreated films, the relationship of TiN film surface topogragh and the wear pattern of corresponding courterpart were proved, the more smooth and the smaller the roughness of the surface, the corresponding courterpart has less small amount of wear.