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Study On Wet Chemical Preparation Of Black Silicon Material Based On Solar Cell Application

Posted on:2014-11-10Degree:MasterType:Thesis
Country:ChinaCandidate:C J LiaoFull Text:PDF
GTID:2132330422488329Subject:Agricultural Biological Environmental and Energy Engineering
Abstract/Summary:PDF Full Text Request
Black silicon is a new photoelectric material obtained by surface modification ofsilicon materials (poly-crystalline-, mono-crystalline-, amorphous silicon). It caneffectively reduce the solar spectral reflectivity and enhanced solar spectralabsorption range from250to2500μm. Therefore, black silicon was considered to beone of the important candidate materials for the preparation of the highly efficientsilicon solar cells. Black silicon has been prepared by various methods around thesilicon solar cell research. Up to now, however, they are unsuitable for the industrialproduction of solar cells.In order to produce black silicon used for industrial silicon solar cells. In thispaper, wet chemical etching experimental apparatus was designed and produced bymyself. Mono-crystalline silicon has been etched comprehensive in etching solutionwhich contained metal particles of Au, Ag, Cu, respectively. The surfacemicrostructure, optical properties and electrical properties were investigatedcharacterized by optical microscope, microscope scanning electron(SEM),UV-VIS-NIR spectrophotometer and microwave photoconductive decay system(μ-PCD)respectively.The results show that:1、 The enhanced wide spectral absorption silicon surface using Au hasmicro/nano dual-scale light trapping structure, its average reflectance is less than5.5%in the range of350to2500nm;2、The sample obtained solar spectral selective absorption characteristic usingAg, its average reflectance, which is as low as8.81%in the range of350to1000nmand up to58.04%in the range of1100-2500nm;3、The sample using Cu obtained anti-reflective characteristic close to pyramidtextured surface, its average reflectance is roughly14.07%in the range of350-1000nm;4、The mechanism of metal-catalyzed chemical etching depends mainly on twoaspects of the electric charge transfer and its gains and losses; 5、The mono-crystalline silicon surface with continuous micro-nano structure hasselective absorption characteristic, and its with discrete micro-nano structure has widespectral absorption characteristic.
Keywords/Search Tags:Black silicon, Material-catalyzed liquid etch, Wide spectralabsorption, Selective absorption, Light-trapping
PDF Full Text Request
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